Area-Selective Etching of Poly(methyl methacrylate) Films by

Patterning two‐dimensional semiconductors with thermal etching - Liu - InfoMat - Wiley Online Library

Surface Initiated Polymer Thin Films for the Area Selective Deposition and Etching of Metal Oxides

Left) SIS lithography using block copolymer. a) Self-assembled

Selective directed self-assembly of coexisting morphologies using block copolymer blends

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Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

Single-step plasma-induced hierarchical structures for tunable water adhesion

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Manufacturing of Functional Materials and Devices